High power 808 nm diode lasers grown by MOCVD using MO group V sources in N2 ambient.

Autor: Tang Xiahong, Bo baoxue, Zhang Baolin, Tjin Swee Chuan
Zdroj: 2004 International Conference on Communications, Circuits & Systems (IEEE Cat. No.04EX914); 2004, p609-609, 1p
Databáze: Complementary Index