Charging damage in dual gate oxide process.
| Autor: | Jin, Y., Lim, H.F., Tong, A.F., Gn, F.H., Low, A.S., Teo, W.Y., Hou, Y.T., Li, M.F. |
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| Zdroj: | 2001 6th International Conference on Solid-State & Integrated Circuit Technology. Proceedings (Cat. No.01EX443); 2001, p970-970, 1p |
| Databáze: | Complementary Index |
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