A scaleable metal-insulator-metal capacitors process for 0.35 to 0.18 μm analog and RFCMOS.
| Autor: | Kai Shao, Sanford Chu, Kok-Wai Chew, Guan-Ping Wu, Chit-Hwei Ng, Tan, N., Shen, B., Yin, A., Zhe-Yuan Zheng |
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| Zdroj: | 2001 6th International Conference on Solid-State & Integrated Circuit Technology. Proceedings (Cat. No.01EX443); 2001, p243-243, 1p |
| Databáze: | Complementary Index |
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