Dopant ion induced electron emission yield from IC target materials.
| Autor: | Arrale, A.M., Zhao, Z.Y., Cherekdjian, S. |
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| Zdroj: | Proceedings of the 14th International Conference on Ion Implantation Technology, 2002; 2002, p575-578, 4p |
| Databáze: | Complementary Index |
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