Shallow junction technology for advanced CMOS devices - transitioning to plasma doping from beamline implantation.
| Autor: | Walther, S.R., Variam, N., Norasethekul, S., Weeman, J., Mehta, S. |
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| Zdroj: | Proceedings of the 14th International Conference on Ion Implantation Technology, 2002; 2002, p103-106, 4p |
| Databáze: | Complementary Index |
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