Effects of beam incident angle control on NMOS source/drain extension applications.
Autor: | Ukyo Jeong, Mehta, S., Campbell, C., Lindberg, R., Zhiyong Zhao, Cusson, B., Buller, J. |
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Zdroj: | Proceedings of the 14th International Conference on Ion Implantation Technology, 2002; 2002, p64-68, 5p |
Databáze: | Complementary Index |
Externí odkaz: |