Effects of beam incident angle control on NMOS source/drain extension applications.

Autor: Ukyo Jeong, Mehta, S., Campbell, C., Lindberg, R., Zhiyong Zhao, Cusson, B., Buller, J.
Zdroj: Proceedings of the 14th International Conference on Ion Implantation Technology, 2002; 2002, p64-68, 5p
Databáze: Complementary Index