Fabrication of ultra thick, ultra high aspect ratio microcomponents by deep and ultra deep X-ray lithography.
| Autor: | Jian, L., Loechel, B., Scheunemann, H.-U., Bednarzik, M., Desta, Y.M., Goettert, J. |
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| Zdroj: | Proceedings International Conference on MEMS, NANO & Smart Systems; 2003, p10-14, 5p |
| Databáze: | Complementary Index |
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