Extraordinary low transmission of a metamaterial for application in lithography.

Autor:	Dobmann, S., Ploss, D., Reibold, D., Erdmann, A., Peschel, U.
Zdroj:	2010 Conference on Lasers & Electro-Optics (CLEO) & Quantum Electronics & Laser Science Conference (QELS); 2010, p1-2, 2p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu