A high reliability metal insulator metal capacitor for 0.18 μm copper technology.
| Autor: | Armacost, M., Augustin, A., Felsner, P., Feng, Y., Friese, G., Heidenreich, J., Hueckel, G., Prigge, O., Stein, K. |
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| Zdroj: | International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138); 2000, p157-160, 4p |
| Databáze: | Complementary Index |
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