High performance k=2.5 ULK backend solution using an improved TFHM architecture, extendible to the 45nm technology node.
| Autor: | Fox, R., Hinsinger, O., Richard, E., Sabouret, E., Berger, T., Goldberg, C., Humbert, A., Imbert, G., Brun, P., Ollier, E., Maurice, C., Guillermet, M., Monget, C., Plantier, V., Bono, H., Zaleski, M., Mellier, M., Jacquemin, J.P., Flake, J., Sharma, B.G. |
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| Zdroj: | IEEE International Electron Devices Meeting, 2005. IEDM Technical Digest; 2005, p81-84, 4p |
| Databáze: | Complementary Index |
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