Demonstration of an extendable and industrial 300mm BEOL integration for the 65-nm technology node.
| Autor: | Hinsinger, O., Fox, R., Sabouret, E., Goldberg, C., Verove, C., Besling, W., Brun, P., Josse, E., Monget, C., Belmont, O., Van Hassel, J., Sharma, B.G., Jacquemin, J.P., Vannier, P., Humbert, A., Bunel, D., Gonella, R., Mastromatteo, E., Reber, D., Farcy, A. |
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| Zdroj: | IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004; 2004, p317-320, 4p |
| Databáze: | Complementary Index |
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