Study on the removal rate stability of CMP for ULSI silicon substrate.
| Autor: | Jianwei Zhou, Qiaoshuo Shi, Qiaoyun Zhao |
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| Zdroj: | 2010 10th IEEE International Conference on Solid-State & Integrated Circuit Technology (ICSICT); 2010, p126-128, 3p |
| Databáze: | Complementary Index |
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