Impact of additional LDD rapid thermal annealing on submicron n-MOSFETs.
| Autor: | Qian Wensheng, Leong, V.K.W., Wang Yuwen, Li Yisuo, Pandey Shesh Mani, Manju, S., Benistant, F., Chu, S. |
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| Zdroj: | Advanced Semiconductor Manufacturing Conference & Workshop, 2003 IEEEI/SEMI; 2003, p234-237, 4p |
| Databáze: | Complementary Index |
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