SOI substrate readiness for 22/20 nm and for fully depleted planar device architectures.
| Autor: | Delprat, D., Boedt, F., David, C., Reynaud, P., Alami-Idrissi, A., Landru, D., Girard, C., Maleville, C. |
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| Zdroj: | 2009 IEEE International SOI Conference; 2009, p1-4, 4p |
| Databáze: | Complementary Index |
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