Passivation of highly boron doped silicon surfaces by sputtered AlOx and PECVD SiN, a comparison.
| Autor: | Li, T.A., Cuevas, A., Tan, J., Samundsett, C., Saynova, D., Geerligs, B. |
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| Zdroj: | 2010 Conference on Optoelectronic & Microelectronic Materials & Devices (COMMAD); 2010, p125-126, 2p |
| Databáze: | Complementary Index |
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