High accuracy step-and-repeat uv imprint lithography for wafer level camera master manufacturing.
| Autor: | Kreindl, G., Glinsner, T., Fo?disch, R., Treiblmayr, D., Miller, R. |
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| Zdroj: | 2010 10th IEEE Conference on Nanotechnology (IEEE-NANO); 2010, p347-351, 5p |
| Databáze: | Complementary Index |
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