A novel CVD-SiBCN Low-K spacer technology for high-speed applications.
| Autor: | Ko, C.H., Kuan, T.M., Kangzhan Zhang, Tsai, G., Seutter, S.M., Wu, C.H., Wang, T.J., Ye, C.N., Chen, H.W., Ge, C.H., Wu, K.H., Lee, W.C. |
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| Zdroj: | 2008 Symposium on VLSI Technology; 2008, p108-109, 2p |
| Databáze: | Complementary Index |
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