Novel plasma enhanced atomic layer deposition technology for high-k capacitor with EOT of 8 Å on conventional metal electrode.
| Autor: | Seok-Jun Won, Yong-Kuk Jeong, Dae-Jin Kwon, Moon-Han Park, Ho-Kyu Kang, Kwang-Pyuk Suh, Hong-Ki Kim, Jae-Hwan Ka, Kwan-Young Yun, Duck-Hyung Lee, Dae-Youn Kim, Yong-Min Yoo, Choon-Soo Lee |
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| Zdroj: | 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407); 2003, p23-24, 2p |
| Databáze: | Complementary Index |
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