Addressing materials and process-integration issues of NiSi silicide process using impurity engineering.
| Autor: | Chi, D.Z., Lee, R.T.P., Chua, S.J. |
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| Zdroj: | Fourth International Workshop on Junction Technology, 2004 (IWJT '04); 2004, p113-118, 6p |
| Databáze: | Complementary Index |
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