High Volume Manufacturing Ramp In 90nm Dual Stress Liner Technology.
| Autor: | Gehres, R., Malik, R., Amos, R., Brown, J., Butt, S., Chan, A., Collins, C., Colwill, B., Davies, B., Gabor, A., Le, N., Lindo, P., Mello, K., Meyette, E., Nastasi, V., Patrick, J., Piper, A., Prakash, D.P., Rust, T., Santiago, A. |
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| Zdroj: | 17th Annual SEMI/IEEE ASMC 2006 Conference; 2006, p411-416, 6p |
| Databáze: | Complementary Index |
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