Single mask metal-insulator-metal (MIM) capacitor with copper damascene metallization for sub-0.18 μm mixed mode signal and system-on-a-chip (SoC) applications.
| Autor: | Ruichen Liu, Cheng-Yih Lin, Harris, E., Merchant, S., Downey, S.W., Weber, G., Ciampa, N.A., Wai Tai, Lai, W.Y.C., Morris, M.D., Bower, J.E., Miner, J.F., Frackoviak, J., Mansfield, W., Barr, D., Keller, R., Chong-Ping Chang, Chien-Shing Pai, Rogers, S.N., Gregor, R. |
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| Zdroj: | Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407); 2000, p111-113, 3p |
| Databáze: | Complementary Index |
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