A sub-surface metallization post-process IC module for RF technology.

Autor: Ng, K.T., Pham, N.P., Rejaei, B., Sarro, P.M., Burghartz, J.N.
Zdroj: Proceedings of the 2000 BIPOLAR/BiCMOS Circuits & Technology Meeting (Cat. No.00CH37124); 2000, p195-198, 4p
Databáze: Complementary Index