Systematic method to optimize conditioning process through real time plasma monitoring.
Autor: | Kye Hyun Baek, Yong Jin Kim, Gyung Jin Min, Chang Jin Kang, Han Ku Cho, Joo Tae Moon |
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Zdroj: | ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005; 2005, p129-131, 3p |
Databáze: | Complementary Index |
Externí odkaz: |