Fabrication of 0.1μm-gate InP HEMTs using i-line lithography.
| Autor: | Sawada, K., Makiyama, K., Takahashi, T., Nozaki, K., Igarashi, M., Kon, J., Hara, N. |
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| Zdroj: | International Conference on Indium Phosphide & Related Materials, 2003; 2003, p65-68, 4p |
| Databáze: | Complementary Index |
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