Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl/sub 2/.
| Autor: | Carlstrom, C.F., van der Heijden, R., Kok, A.A.M., van der Heijden, R.W., Karouta, F., van der Tol, J.J.G.M., Notzel, R., van Veldhoven, P.J., Salemink, H.W.M. |
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| Zdroj: | International Conference on Indium Phosphide & Related Materials, 2005; 2005, p500-503, 4p |
| Databáze: | Complementary Index |
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