Ultra-shallow junction formation using flash annealing and advanced doping techniques.
| Autor: | Gelpey, J., McCoy, S., Kontos, A., Godet, L., Hatem, C., Camm, D., Chan, J., Papasouliotis, G., Scheuer, J. |
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| Zdroj: | Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08); 2008, p82-86, 5p |
| Databáze: | Complementary Index |
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