Investigation of wafer temperature effect during implant for PMOS transistor fabrication.

Autor: Tae-Hoon Huh, Byung-Jae Kang, Geum-Joo Ra, Shin-Woo Kang, Kim, S., Reece, R., Rubin, L.M., Min-Sung Lee, Jong-Oh Lee, Dong-Chul Park
Zdroj: Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08); 2008, p39-42, 4p
Databáze: Complementary Index