Scaling of Floating Gate electrode for sub-40nm flash technologies.
Autor: | De Vos, J., Wellekens, D., Debusschere, I., Van Houdt, J., Van Aerde, S.R.A., Fischer, P.R., Zagwijn, P.M. |
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Zdroj: | ESSDERC 2008 - 38th European Solid-State Device Research Conference; 2008, p123-125, 3p |
Databáze: | Complementary Index |
Externí odkaz: |