Scaling of Floating Gate electrode for sub-40nm flash technologies.

Autor: De Vos, J., Wellekens, D., Debusschere, I., Van Houdt, J., Van Aerde, S.R.A., Fischer, P.R., Zagwijn, P.M.
Zdroj: ESSDERC 2008 - 38th European Solid-State Device Research Conference; 2008, p123-125, 3p
Databáze: Complementary Index