ALD metal-gate/high-κ gate stack for Si and Si0.7Ge0.3 surface-channel pMOSFETs.
| Autor: | Wu, D., Persson, S., Lindgren, A.-C., Sjoblom, G., Hellstrom, P.-E., Olsson, J., Zhang, S.-L., Ostling, M., Vainonen-Ahlgren, E., Tois, E., Li, W.-M., Tuominen, M. |
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| Zdroj: | ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003; 2003, p263-266, 4p |
| Databáze: | Complementary Index |
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