Laminated metal gate electrode with tunable work function for advanced CMOS.
| Autor: | Bae, S.H., Bai, W.P., Wen, H.C., Mathew, S., Bera, L.K., Balasubramanian, N., Yamada, N., Li, M.F., Kwong, D.L. |
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| Zdroj: | 2004 Digest of Technical Papers. 2004 Symposium on VLSI Technology; 2004, p188-189, 2p |
| Databáze: | Complementary Index |
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