Characterization and evaluation of ALD-HfO2 using H2O and D2O as an oxidant.
| Autor: | Taeho Lee, In-Sung Park, Han-Kyoung Ko, Sangsul Lee, Kyong-Rae Kim, Jinho Ahn |
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| Zdroj: | 2005 Digest of Papers Microprocesses & Nanotechnology; 2005, p94-95, 2p |
| Databáze: | Complementary Index |
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