ECR etching of α-Ta for x-ray mask absorber using chlorine and fluoride gas mixture.
| Autor: | Tsuchizawa, T., Iriguchi, H., Takahashi, C., Shimada, M., Uchiyama, S., Oda, M. |
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| Zdroj: | 2000 International Microprocesses & Nanotechnology Conference Digest of Papers Microprocesses & Nanotechnology 2000 (IEEE Cat. No.00EX387); 2000, p50-51, 2p |
| Databáze: | Complementary Index |
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