Polymer free reactive ion beam etching of InP using N2/(CH3)3N.
| Autor: | Carlstrom, C.F., Anand, S., Landgren, G. |
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| Zdroj: | Conference Proceedings 2000 International Conference on Indium Phosphide & Related Materials (Cat. No.00CH37107); 2000, p298-301, 4p |
| Databáze: | Complementary Index |
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