Cathode sputtered permalloy films of high AMR effect and low coercivity.
| Autor: | Stangl, G., Aigner, P., Hudek, P., Kostic, I., Chabicovsky, R., Hauser, H., Hochreiter, J., Riedling, K. |
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| Zdroj: | ASDAM 2000. Conference Proceedings Third International EuroConference on Advanced Semiconductor Devices & Microsystems (Cat. No.00EX386); 2000, p151-155, 5p |
| Databáze: | Complementary Index |
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