Characterization of ultra thin high K gate dielectrics by grazing x-ray reflectance and Spectroscopic Ellipsometry on the same instrument.
| Autor: | Boher, P., Stehle, J.-L., Defranoux, C., Bourtault, S., Piel, J.-P., Evrard, P. |
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| Zdroj: | 31st European Solid-State Device Research Conference; 2001, p391-394, 4p |
| Databáze: | Complementary Index |
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