CAD utilities to comprehend layout-dependent stress effects in 45 nm high- performance SOI custom macro design.
Autor: | Sultan, A., Faricelli, J., Suryagandh, S., van Meer, H., Mathur, K., Pattison, J., Hannon, S., Constant, G., Kumar, K., Carrejo, K., Meier, J., Topaloglu, R.O., Chan, D., Hahn, U., Knopp, T., Andrade, V., Gardiol, B., Hejl, S., Wu, D., Buller, J. |
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Zdroj: | 2009 10th International Symposium on Quality Electronic Design; 2009, p442-446, 5p |
Databáze: | Complementary Index |
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