Linewidth Roughness and Cross-sectional Measurements of Sub-50 nm Structures Using CD-SAXS and CD-SEM.
| Autor: | Chengqing Wang, Kwang-Woo Choi, Wei-En Fu, Jones, R.L., Ho, D.L., Soles, C., Lin, E.K., Wen-li Wu, Clarke, J.S., Villarrubia, J.S., Bunday, B. |
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| Zdroj: | 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference; 2008, p142-147, 6p |
| Databáze: | Complementary Index |
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