Line edge roughness and spacing effect on low-k TDDB characteristics.
| Autor: | Chen, F., Lloyd, J.R., Chanda, K., Achanta, R., Bravo, O., Strong, A., McLaughlin, P.S., Shinosky, M., Sankaran, S., Gebreselasie, E., Stamper, A.K., He, Z.X. |
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| Zdroj: | 2008 IEEE International Reliability Physics Symposium; 2008, p132-137, 6p |
| Databáze: | Complementary Index |
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