Single wafer all-wet photo resist strip process for LDD implant in CMOS technology.
| Autor: | Bonfanti, P., Sellmer, R., Glen Liu, Youfeng He, Liu Hao, Henry, S.-A., Deutschmann, L., Archer, L. |
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| Zdroj: | 2008 9th International Conference on Solid-State & Integrated-Circuit Technology; 2008, p1177-1179, 3p |
| Databáze: | Complementary Index |
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