A Novel Isolation Scheme featuring Cavities in the Collector for a High-Speed 0.13μm SiGe:C BiCMOS Technology.

Autor: Choi, L.J., Van Huylenbroeck, S., Donkers, J., van Noort, W.D., Piontek, A., Sibaja-Hernandez, A., Meunier-Beillard, P., Neuilly, F., Kunnen, E., Leray, P., Vleugels, F., Venegas, R., Hijzen, E., Decoutere, S.
Zdroj: 2007 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems; 2007, p158-161, 4p
Databáze: Complementary Index