Thickness and Topography of Dielectric Dual-Sidewall Spacers on Metal Gate of DRAM Extracted by Spectroscopic Ellipsometry.

Autor: Jun-Wei Gong, Yeh-Chang Fang, Ta-Yung Wang, Jia-Rui Hu, Chung-I Chang, Tings Wang, Shih-Jung Lee, Opsal, J., Nicolaides, L.
Zdroj: 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference; 2007, p272-277, 6p
Databáze: Complementary Index