Thickness and Topography of Dielectric Dual-Sidewall Spacers on Metal Gate of DRAM Extracted by Spectroscopic Ellipsometry.
Autor: | Jun-Wei Gong, Yeh-Chang Fang, Ta-Yung Wang, Jia-Rui Hu, Chung-I Chang, Tings Wang, Shih-Jung Lee, Opsal, J., Nicolaides, L. |
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Zdroj: | 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference; 2007, p272-277, 6p |
Databáze: | Complementary Index |
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