NiSi Schottky Barrier Process-Strained Si (SB-PSS) CMOS Technology for High Performance Applications.
| Autor: | Ko, C.H., Chen, H.W., Wang, T.J., Kuan, T.M., Hsu, J.W., Huang, C.Y., Ge, C.H., Lai, L.S., Lee, W.C. |
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| Zdroj: | 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.; 2006, p80-81, 2p |
| Databáze: | Complementary Index |
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