Investigation of FinFET Devices for 32nm Technologies and Beyond.
| Autor: | Shang, H., Chang, L., Wang, X., Rooks, M., Zhang, Y., To, B., Babich, K., Totir, G., Sun, Y., Kiewra, E., Ieong, M., Haensch, W. |
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| Zdroj: | 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.; 2006, p54-55, 2p |
| Databáze: | Complementary Index |
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