Carbon-Rich SiOCH Films with Hydrocarbon Network Bonds for Low-k Dielectrics: First-Principles Investigation.

Autor: Tajima, N., Ohno, T., Hamada, T., Yoneda, K., Kobayashi, N., Shinriki, M., Miyazawa, K., Sakota, K., Hasaka, S., Inoue, M.
Zdroj: 2006 International Interconnect Technology Conference; 2006, p122-124, 3p
Databáze: Complementary Index