Advantage of Siconi Preclean over Wet Clean for Pre Salicide Applications Beyond 65nm Node.
| Autor: | Jianxin Lei, See-Eng Phan, Xinliang Lu, Chien-Teh Kao, Lavu, K., Moraes, K., Tanaka, K., Wood, B., Biju Ninan, Gandikota, S. |
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| Zdroj: | 2006 IEEE International Symposium on Semiconductor Manufacturing; 2006, p393-396, 4p |
| Databáze: | Complementary Index |
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