A scalable Stacked Gate NOR/NAND Flash Technology compatible with high-k and metal gates for sub 45nm generations.
| Autor: | De Vos, J., Haspeslagh, L., Demand, M., Devriendt, K., Wellekens, D., Beckx, S., Houdt, J.V. |
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| Zdroj: | 2006 IEEE International Conference on IC Design & Technology; 2006, p1-4, 4p |
| Databáze: | Complementary Index |
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