Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etchings method.
| Autor: | Hippo, D., Kawata, Y., Tsuchiya, Y., Mizuta, H., Oda, S., Urakawa, K., Koshida, N. |
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| Zdroj: | 2006 Conference on Lasers & Electro-Optics & 2006 Quantum Electronics & Laser Science Conference; 2006, p1-2, 2p |
| Databáze: | Complementary Index |
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