Characterization of 4H-SiC MOSFET Interface Trap Charge Density Using a First Principles Coulomb Scattering Mobility Model and Device Simulation.

Autor: Potbhare, S., Goldsman, N., Pennington, G., McGarrity, J.M., Lelis, A.
Zdroj: 2005 International Conference On Simulation of Semiconductor Processes & Devices; 2005, p95-98, 4p
Databáze: Complementary Index