Reduction of plasma-induced damage during intermetal dielectric deposition in high-density plasma.
| Autor: | Kyung-Mun Byun, Do-Hyung Kim, Yong-Won Cha, Sang-Hyeon Lee, Min Kim, Joo-Beom Lee, In-Sun Park, Hyeon-Deok Lee, Chang-Lyong Song |
|---|---|
| Zdroj: | 2005 International Conference on Integrated Circuit Design & Technology, 2005. ICICDT 2005; 2005, p99-102, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|