Plasma induced substrate damage in high dose implant resist strip process.
| Autor: | Bor-Wen Chan, Baw-Ching Perng, Sheu, L., Yuan-Hung Chiu, Han-Jan Tao |
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| Zdroj: | 2003 8th International Symposium Plasma- & Process-Induced Damage; 2003, p73-76, 4p |
| Databáze: | Complementary Index |
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